sputtering targets for physical vapor deposition

Brand Name:JINXING

Model Number:Nickel Granular

Place of Origin:China

Nickel Granular purity 99.95%, 99.99%, 99.999% 3x3mm ,6x6mm, 3x6mm High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor ...

Brand Name:JXS

Place of Origin:China

...various industries. It operates under high vacuum conditions to deposit thin, uniform coatings on substrates through physical vaporization processes. This equipment utilizes techniques such as sputtering, evaporation, or arc deposition to create durable,

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

133OD*125ID*2940L Include Flange Titanium Tube Target Titanium Gr2 ASTM B861-06 a The Target Material Vacuum Coating Name Titanium tube target Standard ASTM B861-06 a Transport Package Vacuum package in wooden case Origin Baoji, Shaanxi, China Port of ...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...

Brand Name:CSTI

Model Number:20221010

Place of Origin:China

...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets...

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

...Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials is paramount. Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targets

Brand Name:Hypersolid Metal

Place of Origin:China

... substrates. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties. They are known for their high melting point, good adhesion, and uniform film deposition. Molybdenum targets are widely used in industries such

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.. The sputtering is mainly used in: flat panel displays,

Brand Name:Lion King

Place of Origin:Guangdong

...arranged perpendicularly. It uses a magnetic field to confine the plasma, enabling ions to efficiently bombshell the vertically installed target material. After the target material atoms/molecules escape, they are vertically deposited on the surface of the

Brand Name:ROYAL

Model Number:PVD-Ni1600

Place of Origin:China

PVD Nickel (Physical Vapor Deposition Nickel) coating is a type of thin film coating applied through a physical vapor deposition process. Here's some information about PVD Nickel coatings: Composition: PVD Nickel coatings are primarily composed of nickel (...

Brand Name:GVAC

Model Number:GVAC-1500

What is PVD? PVD stands for Physical Vapor Deposition. It is a kind of thin-film coating technique and a process in which a solid material is vaporized in a vacuum environment and deposited onto the surface of substrates. PVD process can transfer the ...

Place of Origin:China

...Physical Vapor Deposition (Physical Vapor Deposition) in English. It refers to the use of low-voltage, high-current arc discharge technology under vacuum conditions, which uses gas discharge to evaporate the target material and ionize the vaporized substance and gas, using electric field The acceleration effect of the vaporized

Brand Name:Sifon

Model Number:tungsten wire

Place of Origin:China

... area, melting equipment, oil industry etc.high purity, ≥99.95%;high density, 99% or higher;O content less than 20ppm.Sputtering target is a bombarding materials for preparing electronic thin film materials by physical vapor deposition. It is mainly used

Brand Name:DST

Model Number:MCA-850s

Place of Origin:China Hefei

... uses the magnetron sputtering cathode glow discharge technique to ionize and deposit the molecule(target) on the base material(PVD), as well as the resistance heating technique in the vacuum to melt the metal wire and or vaporize the metal molecule. Thus...