sputtering target titanium target

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

... substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit onto a surface. This results in the ...

Brand Name:Jinxing

Model Number:Sputtering Target Titanium-Aluminum

Place of Origin:China

Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool coatings and decorative coatings. Compared with the melting process, the TiAl target prepared by the HIP process has a more uniform microscopic internal structure and a smaller grain size, which is suitable for various magnetron sputtering...

Brand Name:Changsheng

Model Number:Titanium Sputtering Target Tube Targets

Place of Origin:China

...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Model Number:Tungsten Sputtering Target

W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ...

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Brand Name:Forged

Place of Origin:Luoyang

Model Number:customized

... resistance. 3.Grain size uniformity. Customized service. About sputtering Sputtering is essential technology in different industries as follows Architecture glass, PV/Solar,Decoration, Semiconductor,Optics/Optronics, FPD. 1.Packaging ...

Brand Name:PRM

Model Number:Custom

Place of Origin:China

Product Information: Product name Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM ...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:HMD

Model Number:NONE

Place of Origin:CHN

...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...

Brand Name:High Broad

Model Number:Hf sputtering targets

Place of Origin:China

Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ...

Place of Origin:Guangdong

Brand Name:Lion King

...Sputtering Chamber Size Can Be Customized According to Details Requirement Application Sanitary Ware, Car Wheel, Hard Ware, Cutleryetc Coating Color Golden, Rose Gold, Black, Blue, Rainbow Color, etc Coating Film Tin, Tic, Ticn, Tialn, Crn, Cu, etc Sputtering Target Titanium, Chrome, Zirconium, Titanium...

Brand Name:JXS

Place of Origin:China

... Arc Source Size: Diameter100mm x Thickness40mm Arc Power Supply: 200A Bias Power Supply: 1 Set Plane Magnetron Sputtering Target: 2 Sets DC Magnetron Sputtering Target: 2 Sets Chamber Cooling Way: Indirect