Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets......
Baoji City Changsheng Titanium Co.,Ltd
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Zirconium Zr702 High Purity Metal Sputtering Targets
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... in multiple corrosive environments. 3. Zirconium has good corrosion resistance in nitric acid not more than 90% below 200℃. However, the stress corrosion cracking sensitivity of zirconium in ......
JINXING MATECH CO LTD
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering......
Baoji Lihua Nonferrous Metals Co., Ltd.
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ......
Gnee Steel (tianjin) Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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20mm Molybdenum Sputtering Targets For The Semiconductor Industry Molybdenum Target Molybdenum Disc molybdenum products
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...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets......
Shaanxi Peakrise Metal Co.,Ltd
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Molybdenum Disc Factory Moly Disc Vacuum Coating Molybdenum Sputtering Target High Temperature Resistance
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... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The...
Luoyang Hypersolid Metal Tech Co., Ltd
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Customized Aluminum Sheets Metal Al Sputtering Target 0.2mm 7075
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Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high yield strength (>500 MPa) and its low density make the material a fit for ......
Wuxi Cheng Yue Metal Materials Co., Ltd.
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Metal Nickel target,Nickel Oxide Target
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Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step (Dia ≤200mm,, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤300mm, Width......
Hebei Niuke Technology Co., Ltd
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