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All 1100mpa silicon dioxide sputtering target wholesalers & 1100mpa silicon dioxide sputtering target manufacturers come from members. We doesn't provide 1100mpa silicon dioxide sputtering target products or service, please contact them directly and verify their companies info carefully.
| Total 9 products from 1100mpa silicon dioxide sputtering target Manufactures & Suppliers | 
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                                                                                     Brand Name:ZCQ Model Number:ZCQ Place of Origin:China Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (...  | 
                    
                                                    Yantai ZK Optics Co., Ltd.
                                                
                                                    
                        
                        
                         Beijing  | 
                
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                                                                                     Brand Name:JINXING Model Number:Aluminum Silicon Sputtering Target Place of Origin:China ...Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets...  | 
                    
                                                    JINXING MATECH CO LTD
                                                
                                                    
                        
                        
                         
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                    Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD Vacuum Coating MachineBrand Name:LHTi Model Number:Titanium Target Place of Origin:Baoji, Shaanxi, China ...our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to  | 
                    
                                                    Baoji Lihua Nonferrous Metals Co., Ltd.
                                                
                                                    
                        
                        
                         Shaanxi  | 
                
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                                                                                     Brand Name:TK NANO Model Number:0.5-3MM Place of Origin:China SiO2 granule 0.5-3mm 1-3mm 2-4mm or customization 99.99% Chemical name: SiO2 Boiling point: 2230℃ Purity: 4N Specification: 1-4mm, particle, target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum ...  | 
                    
                                                    Chongqing Newsin Technology Co., Ltd
                                                
                                                    
                        
                        
                         Chongqing  | 
                
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                                                                                     Brand Name:ROYAL Model Number:RTAC-SP Place of Origin:Made in China ...deposit Au Gold metal thin film on glass slides, silicon wafers. Except Au gold deposition, other metal targets also available: Silver (Ag), Copper (Cu), Aluminum (Al), Chrome (Cr), Stainless Steel (SS316L), Titanium (Ti) to obtain either ...  | 
                    
                                                    SHANGHAI ROYAL TECHNOLOGY INC.
                                                
                                                    
                        
                        
                         
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                                                                                     Brand Name:JXS Place of Origin:China ...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target...  | 
                    
                                                    Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
                                                
                                                    
                        
                        
                         Guangdong  | 
                
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                                                                                     Brand Name:FUNSONIC Model Number:FSY-2010-PL Place of Origin:CHINA ...Target Welding Machine 20Khz Metal and Non Metal Surface Coating Indium Technology Description: Indium coating machine, also known as target welding machine, is a traditional technique for manually coating indium on metal and non-metal surfaces such as copper plates, ITO glass, and silicon dioxide...  | 
                    
                                                    Hangzhou Qianrong Automation Equipment Co.,Ltd
                                                
                                                    
                        
                        
                         Zhejiang  | 
                
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                                                                                     Brand Name:Silicon carbide / SiC High Broad Model Number:SiC armor Place of Origin:Hunan,China NIJ IV Hard armor Bulletproof Plates Silicon carbide Boron carbide Ceramic independent protection Boron Carbide Tile Uses: Systems, semiconductor components, sputtering targets industrial wear components, boron carbide tiles are used in police and military...  | 
                    
                                                    China Hunan High Broad New Material Co.Ltd
                                                
                                                    
                        
                        
                         Hunan  | 
                
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                                                                                     Brand Name:Baosteel Wisco Model Number:M-19 Place of Origin:CHINA ...Chinese government has announced an action target to control greenhouse gas emissions by 2020: by 2020, China will reduce carbon dioxide emissions per unit of GDP (gross domestic product) by 40 to 45 percent from the 2005 level, which will be included as a  | 
                    
                                                    Wuxi Zhongxin Special Steel Co.,Ltd
                                                
                                                    
                        
                        
                         Jiangsu  |